Liquid source misted chemical deposition process of three-dimensional nano-ferroelectrics with substrate heating

Kawasaki, S. and Scott, J. F. and Fan, H. J. and Catalan, G. and Saad, M. M. and Gregg, J. M. and Correa, M. A. and Morrison, F. D. and Tatsuta, T. and Tsuji, O. (2007) Liquid source misted chemical deposition process of three-dimensional nano-ferroelectrics with substrate heating. Integrated Ferroelectrics, 95 (1). 180 - 186. DOI 10.1080/10584580701758793

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Abstract

A modification of liquid source misted chemical deposition process (LSMCD) with heating mist and substrate has developed, and this enabled to control mist penetrability and fluidity on sidewalls of three-dimensional structures and ensure step coverage. A modified LSMCD process allowed a combinatorial approach of Pb(Zr,Ti)O3 (PZT) thin films and carbon nanotubes (CNTs) toward ultrahigh integration density of ferroelectric random access memories (FeRAMs). The CNTs templates were survived during the crystallization process of deposited PZT film onto CNTs annealed at 650°C in oxygen ambient due to a matter of minute process, so that the thermal budget is quite small. The modified LSMCD process opens up the possibility to realize the nanoscale capacitor structure of ferroelectric PZT film with CNTs electrodes toward ultrahigh integration density FeRAMs.

Item Type:	Article
Additional Information:	Samco, cml
Uncontrolled Keywords:	2007 AREP IA55 2007 P
Subjects:	03 - Mineral Sciences
Divisions:	03 - Mineral Sciences
Journal or Publication Title:	Integrated Ferroelectrics
Volume:	95
Page Range:	180 - 186
Identification Number:	10.1080/10584580701758793
Depositing User:	Sarah Humbert
Date Deposited:	16 Feb 2009 13:02
Last Modified:	23 Jul 2013 10:07
URI:	http://eprints.esc.cam.ac.uk/id/eprint/447

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